发明名称 Source filament assembly for an ion implant machine
摘要 An improved ion implant filament assembly, including shielding and insulation spacers, is provided that reduces the unwanted metal coating between the filament ends which shorts out the filament. An important parts of the invention are ridges on a filament shield which prevent coatings between filament ends and spacer insulators between the filament shield and the stage. The invention comprises a filament having a two parallel extending leads; two screws, each having a central hole; the leads extending through the central hole; a filament shield having two spaced apertures, the spaced apertures receiving the screws from a front side; the filament shield having annular ridges on the back side; a stage having two spaced apertures and a means to fix the stage to the source chamber; two annular spacer insulators positioned between the filament shield and the stage; and two end insulators each having a central aperture adapted to received one of the screws.
申请公布号 US5675152(A) 申请公布日期 1997.10.07
申请号 US19960586521 申请日期 1996.01.16
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. 发明人 WONG, MIDAS
分类号 H01J27/08;H01J27/22;(IPC1-7):H01J27/00 主分类号 H01J27/08
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