发明名称 SEMICONDUCTOR SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To prevent the contact of a metal piece for constituting a pad electrode with a semiconductor element by constituting the electrode by a square pattern having one side along a scribing direction and a plurality of patterns extended substantially perpendicular to the scribing direction from the square pattern. SOLUTION: A monitoring element 2 for inspecting the characteristics of a semiconductor element 4 formed on a semiconductor substrate is formed in a scribing region 3, and a pad electrode 1 is led from the element 2. The electrode 1 is formed of a patterned metal thin film, and has a square pattern 11 having a long side in the scribing direction and a plurality of bar-like patterns 12 extended perpendicularly to the long side of the pattern 11. In the case of cutting the region 3 by a dicing saw, the pattern 11 for forming the pad 2 is finely cut along the scribing line, the metal thin film for constituting the electrode 1 all becomes short metal thin pieces, and is not brought into contact with the semiconductor element.</p>
申请公布号 JPH09246344(A) 申请公布日期 1997.09.19
申请号 JP19960046009 申请日期 1996.03.04
申请人 FUJITSU LTD;FUJITSU VLSI LTD 发明人 MATSUOKA YOSHIHIRO;NIWA YOSHITAKA;ITO SATORU;KATAGIRI TOMOKO
分类号 H01L21/66;H01L21/301;H01L21/822;H01L27/04;(IPC1-7):H01L21/66 主分类号 H01L21/66
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