发明名称 |
BOTTOM ANTIREFLECTIVE COATINGS THROUGH REFRACTIVE INDEX MODIFICATION BY ANOMALOUS DISPERSION |
摘要 |
This invention provides a process for the generation of an antireflective bottom layer with effective reduction of substrate reflectivity and swing curve effects in lithographic applications. It involves the use of a suitably selected monomeric and/or polymeric dye which brings the real part of the refractive index into a range which is optimal for the suppression of reflection-related effects. The refractive index change is effected via anomalous dispersion, i.e., by utilizing changes in the real part of the refractive index caused by the bottom layer's absorption. |
申请公布号 |
WO9733201(A1) |
申请公布日期 |
1997.09.12 |
申请号 |
WO1997US03835 |
申请日期 |
1997.03.06 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
DAMMEL, RALPH, R.;NORWOOD, ROBERT, A. |
分类号 |
H01L21/027;G03F7/004;G03F7/022;G03F7/09;G03F7/11;G03F7/32;G03F7/38;G03F7/40 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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