| 摘要 |
PROBLEM TO BE SOLVED: To enable exposing a semiconductor wafer to a light always under the optimum set condition, by eliminating the set error of equipment which is caused by human error when semiconductor is manufactured. SOLUTION: This equipment is provided with an illuminating equipment capable of changing a plurality of illuminating methods. The illuminating equipment is provided with a stop changeover turret 2 in which a plurality of stop plates having different patterns can be inserted, as a stop changeover mechanism, an identification mark judging sensor which is marked on the different pattern stop plate, and a position conforming sensor 3' for the changeover stop. By the judging sensor and the conforming sensor 3', the kind and the position of the stop of the stop plate on the turret 2 are so set that the equipment is introduced to the desired exposure condition. |
