| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist compsn. having high sensitivity and resolving power, excellent in developability and resist shape and giving a resist image excellent in heat resistance, especially dry etching resistance by incorporating novolak resin obtd. by condensing a specified mixture with aldehyde into an alkali-soluble resin. SOLUTION: This photoresist compsn. contains an alkali-soluble resin contg. novolak resin obtd. by condensing a mixture contg. at least one kind of phenol represented by formula I and at least one kind of compd. represented by formula II with aldehyde. In the formula I, each of R1 -R3 is H, OH, etc. In the formula II, R4 is H, halogen, etc., R5 is H or alkyl, X is a single bond or -C(CH3 )(CH3 )-, each of (m) and (n) is an integer of 1-3, m+n=5 and (1) is an integer of 1-3. |
