An apparatus and method for enhanced inductive coupling to plasmas with reduced sputter contamination,申请号EP19940100093-传众专利搜索

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发明名称	An apparatus and method for enhanced inductive coupling to plasmas with reduced sputter contamination
摘要
申请公布号	EP0607797(B1)	申请公布日期	1997.06.18
申请号	EP19940100093	申请日期	1994.01.05
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	CUOMO, JEROME J.;GUARNIERI, C. RICHARD;HOPWOOD, JEFFREY A.
分类号	C23C14/00;C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):H01J37/32	主分类号	C23C14/00
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