发明名称 |
HEAT-TREATING DEVICE FOR SUBSTRATE |
摘要 |
<p>PROBLEM TO BE SOLVED: To appropriately prevent the sideslip of a substrate when the lower surface of the substrate approaches a hot plate in the case where a heat-treating device for substrate carries in the substrate. SOLUTION: A heat-treating device for substrate is provided with a heating means or cooling means, a hot plate 15 which heats or cools a substrate while the plate 15 supports the substrate put on the plate 15, substrate supporting pins 8 which supports the substrate placed on the pins 8, and an air cylinder 10 which elevates/lowers the hot plate 15 and pins 8 relatively to each other. In this heat-treating device, a groove 20 which leads the air between the lower surface of the substrate and the hot plate 15 to the outside of the plate 5 when the cylinder 10 moves the plate 15 and pins 8 relatively to each other and the lower surface of the substrate approaches the plate 15 is formed on the upper surface of the plate 15.</p> |
申请公布号 |
JPH09148417(A) |
申请公布日期 |
1997.06.06 |
申请号 |
JP19950329888 |
申请日期 |
1995.11.24 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
MATSUSHITA MASANAO;FUKUTOMI YOSHIMITSU |
分类号 |
G11B7/26;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
G11B7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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