发明名称 HEAT-TREATING DEVICE FOR SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To appropriately prevent the sideslip of a substrate when the lower surface of the substrate approaches a hot plate in the case where a heat-treating device for substrate carries in the substrate. SOLUTION: A heat-treating device for substrate is provided with a heating means or cooling means, a hot plate 15 which heats or cools a substrate while the plate 15 supports the substrate put on the plate 15, substrate supporting pins 8 which supports the substrate placed on the pins 8, and an air cylinder 10 which elevates/lowers the hot plate 15 and pins 8 relatively to each other. In this heat-treating device, a groove 20 which leads the air between the lower surface of the substrate and the hot plate 15 to the outside of the plate 5 when the cylinder 10 moves the plate 15 and pins 8 relatively to each other and the lower surface of the substrate approaches the plate 15 is formed on the upper surface of the plate 15.</p>
申请公布号 JPH09148417(A) 申请公布日期 1997.06.06
申请号 JP19950329888 申请日期 1995.11.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MATSUSHITA MASANAO;FUKUTOMI YOSHIMITSU
分类号 G11B7/26;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 G11B7/26
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