发明名称 |
Projection optical system and projection exposure apparatus using the same |
摘要 |
A projection exposure apparatus can correct focal point movement caused by an environmental change, such as a change in temperature or atmospheric pressure, during an operation, while minimizing occurrence of a new aberration such as a spherical aberration caused by focus correction. The projection exposure apparatus of this invention exposes a mask pattern on a photosensitive substrate via a projection optical system. The projection optical system includes a refraction or reflection type optical member, and a diffraction type correction optical member. The correction optical member has focal position movement with an environmental change during an operation in a direction opposite to the direction of focal position movement of the optical member with the environmental change during the operation.
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申请公布号 |
US5636000(A) |
申请公布日期 |
1997.06.03 |
申请号 |
US19950495726 |
申请日期 |
1995.06.27 |
申请人 |
NIKON CORPORATION |
发明人 |
USHIDA, KAZUO;HASHIMOTO, SUMIO |
分类号 |
G02B5/18;G02B7/02;G02B13/24;G02B27/00;G03F7/20;G03F7/207;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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