发明名称 FORMATION OF RESIN BLACK MATRIX
摘要 PROBLEM TO BE SOLVED: To form resin black matrices which have high light shielding performance, have no projections in the parts overlapping on pixels and have good flatness with easy method. SOLUTION: A black resist contg. a cation polymerizable compd., black pigments, a photo-acid generating agent and a solvent is applied over the entire surface on a transparent base material formed with the respective pixels of red, green and blue to prescribed shapes in such a manner that the spacings between the pixels for red, green and blue is buried and is dried. This coating is exposed with UV light from the non-coated surface (rear surface) of the base material and is then subjected to thermal curing and developing, by which the light shielding layers (black matrices) are formed between the respective pixels of red, green and blue.
申请公布号 JPH09133807(A) 申请公布日期 1997.05.20
申请号 JP19950288730 申请日期 1995.11.07
申请人 SUMITOMO CHEM CO LTD 发明人 HOZUMI SHIGEO;TAKEBE KAZUO;SASAKI MANABU
分类号 G03F7/027;B05D5/06;G02B5/00;G02B5/20;G02B5/22;G02F1/1335 主分类号 G03F7/027
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