发明名称 Sprout inhibition compositions comprising chlorpropham and substituted naphthalenes and methods of using same
摘要 Compositions which include a mixture of CIPC and at least one substituted naphthalene are disclosed. The compositions of the present invention are adapted for inhibiting sprout growth in tubers. When so used, the preferred substituted naphthalene in the compositions of the present invention are dimethylnaphthalene (DMN) and diisopropylnaphthalene (DIPN). A method of applying a CIPC/naphthalene mixture is also disclosed. In a preferred embodiment of the method, tubers to be placed in storage are treated with a composition of CIPC and a substituted naphthalene utilizing thermal fogging techniques, with the average effective residue of CIPC on the tubers of from approximately 21 ppm to 2.5 ppm. In the preferred embodiment, the weight ratio of average effective residue of CIPC to the substituted naphthalene is from approximately 1:1 to 1:4. In a most preferred embodiment, a composition including CIPC and either DIPN or DMN is applied to tubers utilizing thermal fogging techniques, to obtain an average effective residue on the outer surface of the tubers of approximately 14 ppm CIPC and 14 ppm of the DIPN or DMN.
申请公布号 US5622912(A) 申请公布日期 1997.04.22
申请号 US19960653222 申请日期 1996.05.24
申请人 PLATTE CHEMICAL COMPANY 发明人 RIGGLE, BRUCE D.;SCHAFER, RONALD K.
分类号 A01N47/20;(IPC1-7):A01N47/20;A01N27/00 主分类号 A01N47/20
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