发明名称 Cleaning agent and cleaning process for harmful gas
摘要 <p>There are disclosed a cleaning agent for removing a fluorine-compound gas such as hydrogen fluoride, fluorine, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride which agent comprises a molded article produced by using strontium hydroxide as a principal component, an organic binding agent as a molding agent and the hydroxide of an alkaline earth metal other than strontium as a molding aid; and a process for cleaning a harmful gas which comprises feeding a harmful gas containing a fluorine-compound gas into a column packed inside with the above cleaning agent to remove the fluorine-compound gas; and exhausting a gas substantially free from the fluorine-compound gas. The above cleaning agent is capable of removing the fluorine-compound gas in high efficiency without causing any danger, thereby making itself well suited to the cleaning of the gases exhausted, for example, from semiconductor manufacturing industries.</p>
申请公布号 EP0764458(A1) 申请公布日期 1997.03.26
申请号 EP19960111258 申请日期 1996.07.12
申请人 JAPAN PIONICS CO., LTD. 发明人 FUKUDA, HIDEKI;OTSUKA, KENJI;ARAKAWA, SATOSHI
分类号 B01D53/68;(IPC1-7):B01D53/68 主分类号 B01D53/68
代理机构 代理人
主权项
地址