| 摘要 |
<p>Methods for the formation and replication of patterns are disclosed, with objectives including economical microfabrication and nanofabrication, suitable for both low and high volume production. A patterned relief is formed on a surface by various techniques, which is then replicated on daughter surfaces. Methods for the reduction or elimination of defects are included. Various compositions may be patterned to address a wide range of applications. Spatial control over copolymer synthesis, synthesis of patterned molecular monolayers and multilayers, fabrication of microelectronic, microelectromechanical and microfluidic devices may be effected by the methods of the present invention. Various articles of manufacture and uses thereof, including improved methods and means for genome analysis, are further disclosed.</p> |
