| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method for an X-ray reflection type mask which provides the X-ray reflection type mask having an accurate reflec tion pattern with high efficiency. SOLUTION: An X-ray reflection multilayer film 2 is formed an a substrate 1, further an X-ray absorption layer 3a having a specified pattern is formed on the multilayer film 2, in order for manufacturing a temporary X-ray reflection type mask. A defective part and a useless part of the X-ray absorption layer 3a are detected, and a resist pattern 4a is so formed on the surface of temporary X-ray reflection type mask that only the defective part is exposed, and then the X-ray absorption layer 3a is formed on the defective part by electrolytic plating or electroless plating method. And, a resist pattern 4b is so formed on the surface of temporary X-ray reflection type mask so that only the useless part is exposed, and the X-ray absorption layer 3b on the useless part is removed by electrolytic polishing.</p> |
