| 摘要 |
A furnace system is used for oxidizing a semiconductor wafer and diffusing a dopant impurity into the semiconductor wafer, and has a first quartz outlet gas nozzle for injecting oxygen gas, a second quartz outlet gas nozzle for injecting hydrogen so as to be burnt in the oxygen and a guard member surrounding an outlet end of the second outlet gas nozzle for spacing a high-temperature flame therefrom, thereby preventing the second quartz outlet gas nozzle from an aged deterioration due to a serious heat cycle.
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