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发明名称
Verfahren zum Absenken von Material mit niedrigem Widerstand in einem Kontaktloch
摘要
申请公布号
DE69120153(T2)
申请公布日期
1996.11.28
申请号
DE19916020153T
申请日期
1991.07.03
申请人
KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP
发明人
OHSHIMA, YOICHI, C/O INTELLECTUAL PROPERTY DIV., MINATO-KU, TOKYO 105, JP
分类号
H01L21/3205;H01L21/28;H01L21/768;(IPC1-7):H01L21/768
主分类号
H01L21/3205
代理机构
代理人
主权项
地址
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