| 摘要 |
Even if an observing charged beam is irradiated upon an observation cross section obliquely from above, it is possible to obtain an observation image equivalent to that obtained when the observing charged beam is irradiated thereupon vertically from above. A wafer to be observed is mounted on the stage. The stage is moved by the stage control section on the basis of coordinate data given by the coordinate inputting section to such a position that an observed position of the wafer can be located just under the ion beam irradiating unit. The ion beam of the ion beam irradiating unit is irradiated upon the wafer surface vertically to form an observation cross section. On the other hand, an electron beam is irradiated from the electron beam irradiating unit upon the observation cross section obliquely from above at an inclination angle with respect to the ion beam irradiating unit. The secondary electrons emitted from the wafer surface are detected by the detector to generate video signals. These video signals are corrected on the basis of the inclination angle, and then converted into image signals equivalent to those obtained when the observation cross section is observed in the vertical direction from above.
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