发明名称 FABRICATION OF ELASTIC SURFACE WAVE APPARATUS
摘要 <p>PURPOSE: To provide a method of fabricating an elastic surface wave apparatus which does not allow corrosion of an electrode material in the case of dividing a piezoelectric substrate on which a plurality of elastic surface wave elements are formed en bloc into individual chips. CONSTITUTION: In a fabrication method of elastic surface wave apparatus comprising a process to form a plurality of elastic surface wave apparatuses on a piezoelectric substrate and a process to divide the piezoelectric substrate into chips, a specific resistance value used in the dividing process is set to a value less than 0.1 (more preferably 0.04) MΩ.cm (not including 0). Moreover, amount of dissolved oxygen used in the dividing process is set to a value less than 1.9 (preferably 1.5) ppm (not including 0). Moreover, specific resistance value of water used in the dividing process is set to a value less than 0.1 (preferably 0.04) MΩ.cm (not including 0).</p>
申请公布号 JPH08264494(A) 申请公布日期 1996.10.11
申请号 JP19960027406 申请日期 1996.01.23
申请人 TDK CORP 发明人 OSANAI KATSUNORI;TAKAHASHI MASAKI;SATO KATSUO
分类号 H01L41/09;H01L21/301;H01L41/22;H03H3/08;(IPC1-7):H01L21/301 主分类号 H01L41/09
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