| 发明名称 |
Exposure apparatus and reflection type mask to be used in the same |
| 摘要 |
A reflection type mask includes a reflective portion having a multilayered film, a non-reflective portion having an absorbing material and being formed on the multilayered film, and a non-reflective portion being defined by destroying the multilayered film.
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| 申请公布号 |
US5549994(A) |
申请公布日期 |
1996.08.27 |
| 申请号 |
US19950393676 |
申请日期 |
1995.02.24 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
WATANABE, YUTAKA;HAYASHIDA, MASAMI |
| 分类号 |
G03F1/00;G03F1/14;G03F7/20;G03F9/00;G21K1/06;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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