EM MEASUREMENT PATTERN FORMING METHOD OF SEMICONDUCTOR DEVICE

摘要

using one of the dies of photomask; manufacturing an EM checking pad(3,4) having same position and size as an original pad, manufacturing same pattern except for a region needed to connect with an EM checking metal line system, manufacturing a same metal line system with an width and length of original metal wiring, and performing same producing process of the semiconductor device on a topology.