Photoresist composition with photosensitive base generator
摘要
The present invention relates to an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.
申请公布号
US5545509(A)
申请公布日期
1996.08.13
申请号
US19940190716
申请日期
1994.02.01
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
CAMERON, JAMES F.;FRECHET, JEAN M. J.;LEUNG, MAN-KIT;NIESERT, CLAUS-PETER;MACDONALD, SCOTT A;WILLSON, CARLTON G.
