| 摘要 |
A clampless heat exchange station for a semiconductor wafer (5) for use in a vacuum chamber, at pressures from 2 Torr to 30 Torr using commercial grade inert gas. The heat exchange chuck (1) has apertures (2) therethrough in the region where the wafer (1) is to be mounted to serve as a miniature gas plenum to provide equal pressure along the bottom and top sides of the wafer (1). This configuration avoids chipping and particle deposition, and provides improved heat transfer rate and wafer temperature uniformity.
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