| 摘要 |
<p>The starting material is a vanadium-containing residue which, calculated on anhydrous basis, is composed of at least 5 percent by weight of carbon. In an oven, the residue a) is thermally treated at temperatures of 400 DEG C to 700 DEG C under an oxidising atmosphere at an O2 partial pressure, measured within the region occupied by the residue, of at least 10-4 bar and/or b) is thermally treated at temperatures of 500 DEG C to 1300 DEG C at an O2 partial pressure, measured within the region occupied by the residue, of at most 10exp(-2) bar. From the oven is withdrawn a solids mixture which is composed of at least 5 percent by weight of vanadium oxide.</p> |
