发明名称 PHOTO-SETTING RESIN COMPOSITION
摘要 <p>PURPOSE: To obtain the subject composition useful as a resist ink for printed- wiring boards, etc., providing a resist film having inhibitory effect on change in color of copper and silver and inhibitory effect on migration by blending a specific photo-setting resin with isocyanuric acid and a photopolymerization initiator. CONSTITUTION: This composition comprising (A) a photo-setting resin containing at least one end unsaturated double bond cross-linkable and curable with light energy such as ultraviolet light, (B) isocyanuric acid (e.g. 1-15 pts.wt. based on 100 pts.wt. of the component A) and (C) a photopolymerization initiator (e.g. benzoin). For example, a resin such as an unsaturated polyester resin or a (meth)acrylate-based is preferably used as the component A.</p>
申请公布号 JPH0892340(A) 申请公布日期 1996.04.09
申请号 JP19940252876 申请日期 1994.09.20
申请人 SHIKOKU CHEM CORP 发明人 FUKUDA HIROYUKI;TAKAYAMA YUKIYOSHI
分类号 C08F2/44;C08F2/50;C08F283/01;C08F290/00;C08F290/06;C08F299/00;C08F299/02;C08F299/04;C08F299/06;C08K5/3477;C08L101/02;C09D5/00;C09D7/12;C09D11/00;C09D163/10;C09D167/06;C09D171/00;C09D175/16;C09J9/00;C09J163/10;C09J167/06;C09J171/00;C09J175/16;G03C1/73;G03F7/027;G03F7/028;G03F7/038;H01B3/30;H01B3/40;H01B3/42;(IPC1-7):C08F299/00 主分类号 C08F2/44
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