Verfahren der Planarisierung von Halbleiterelementen.,申请号DE1989624564T-传众专利搜索

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发明名称	Verfahren der Planarisierung von Halbleiterelementen.
摘要
申请公布号	DE68924564(T2)	申请公布日期	1996.03.21
申请号	DE1989624564T	申请日期	1989.06.20
申请人	TEXAS INSTRUMENTS INC., DALLAS, TEX., US	发明人	SHICHIJO, HISASHI, GARLAND TEXAS 75042, US
分类号	H01L21/302;H01L21/20;H01L21/31;H01L21/338;H01L29/812;(IPC1-7):H01L21/20;H01L21/304	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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