| 摘要 |
PURPOSE: To provide a resist compsn. capable of forming a resist pattern ensuring high working precision and high reliability by a lift-off method and to provide a pattern forming method. CONSTITUTION: A positive resist compsn. contg. novolak resin having repeating units represented by formula I as an alkali-soluble resin, a low nuclear body represented by formula II or III and having phenolic hydroxyl groups and 2-5 benzene rings as a dissolution inhibitor and a compd. having a 1,2- naphthoquinonediazido group represented by formula IV or V as a photosensitive agent is exposed and developed to form a resist pattern of a prescribed shape. In the formulae II, III, (i) is 1 or 2, each of (k), (m) and (p) is an integer of 0 to 3, (n) is an integer of 1 to 4, (q) is an integer of 1 to 3, (r) is 2 or 3, m+p+n<=6 and k+q<=5. |
