METAL PLATING MASK PATTERN

摘要

PURPOSE:To form in uniform film thickness a metal plating mask pattern used as a light shielding layer at the time of exposing a resist layer in a resist pattern forming stage. CONSTITUTION:A dummy pattern part 14 consisting of a metal plating part 15 and a non-plating part 16 are provided at a periphery of a working-effective pattern part 10 in which a pattern corresponding to a resist pattern is formed by metal plating. A dimensional change of the pattern is prevented, and a high precision metal plating mask pattern is obtained even if a substrate has large area. A high precision fine pattern can be formed efficiently by patterning a photo resist layer by using such a metal plating mask pattern.