发明名称 Semiconductor substrate with buried dielectric diamond layer
摘要 The substrate has a layer structure with a disc (1) of a high temp. resistant material, a structured diamond layer (4), a layer of a bonding material (6) and a second disc (9) for integration of power semiconductor components. The diamond layer is deposited on the surface of the first disc so that an edge zone remains uncoated, with a protective layer for preventing oxidation enclosing the diamond layer. Pref. the first disc is provided by a silicon wafer, the bonding material provided by a polysilicon, metal silicide, silicon dioxide, or silicon nitride layer.
申请公布号 DE4426420(C1) 申请公布日期 1996.02.01
申请号 DE19944426420 申请日期 1994.07.26
申请人 DAIMLER-BENZ AKTIENGESELLSCHAFT, 70567 STUTTGART, DE 发明人 WONDRAK, WOLFGANG, DR., 60385 FRANKFURT, DE;KOREC, JACEK, DR., 64546 MOERFELDEN, DE;ZACHAI, REINHARD, DR., 89312 GUENZBURG, DE
分类号 H01L21/762;(IPC1-7):H01L27/04;H01L49/00 主分类号 H01L21/762
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