发明名称 Micro-pillar fabrication utilizing a stereolithographic printing process
摘要 Another aspect of the present invention comprises a method for fabricating columnar supports used for an evacuated display, in which an electrode plate is covered with a layer of material having a depth. The material is used to form the columnar supports, and the depth of the layer represents the height of the columnar supports. The material is selectively irradiated with light energy in a pattern causing the material to harden, thereby forming the columnar supports.
申请公布号 US5484314(A) 申请公布日期 1996.01.16
申请号 US19940322903 申请日期 1994.10.13
申请人 MICRON SEMICONDUCTOR, INC. 发明人 FARNWORTH, WARREN M.
分类号 H01J9/18;H01J9/24;H01J17/16;(IPC1-7):H01J9/18 主分类号 H01J9/18
代理机构 代理人
主权项
地址