发明名称 |
HORIZONTAL VAPOR GROWTH DEVICE |
摘要 |
<p>PURPOSE:To prevent the surface of a substrate from being contaminated in the case where the substrate is exchanged in a horizontal MOCVD device. CONSTITUTION:An opening 21a is provided in a part of the lower tube wall of a lateral reaction tube 21 of a horizontal MOCVD device and a susceptor 23 is constituted detachably to this opening 21a. The susceptor 23 is constituted integrally with a heating use heater 29. The susceptor 23 and the heater 29 are mounted on a susceptor pedestal 33 movable in the vertical directions to the tube 21 via support springs 32. In the case where a substrate S on the susceptor 23 is exchanged, the pedestal 33 is made to descend to introduce the susceptor 23 in the interior of a substrate exchange chamber 22 and the substrate S is vacuum-sucked by a finger arm 41 mounted on the tip of a robot arm 40.</p> |
申请公布号 |
JPH07321056(A) |
申请公布日期 |
1995.12.08 |
申请号 |
JP19940131374 |
申请日期 |
1994.05.20 |
申请人 |
SONY CORP |
发明人 |
KAWAI HIROHARU;ENOMOTO MASAHISA |
分类号 |
C23C14/28;C23C16/44;H01L21/205;H01L21/68;(IPC1-7):H01L21/205 |
主分类号 |
C23C14/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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