| 摘要 |
<p>PURPOSE:To develop a cleaner by which harmful acidic gas such as boron trichloride, chlorine, hydrogen chloride, hydrogen bromide, boron trifluoride, tungsten hexafluoride and silicon tetrafluoride contained in waste gas or the like is efficienly discharged from a semiconductor production process. CONSTITUTION:A composition consisting essentially of strontium hydroxide and iron oxide such as triiron tetroxide which water or the like is added to them to form is used. It is preferable that a binder or the like is added to the composition and forming is carried out to form a cleaner.</p> |
