发明名称 Method of manufacturing semiconductor elements
摘要 A method of manufacturing semiconductor elements with metal electrode films formed thereon in which the elements are spread on a metal screen having a mesh size small enough to prohibit the semiconductor elements from passing through it. The metal screen with the semiconductor elements on it is moved cyclically with a periodic motion substantially in a horizontal plane. As a result, burrs extending from the metal electrodes of the semiconductor elements are cut away or bent against the electrode surfaces of the semiconductor elements. The cyclic motion of the screen may be performed by tracing a figure-8 path.
申请公布号 US5462900(A) 申请公布日期 1995.10.31
申请号 US19930125547 申请日期 1993.09.23
申请人 ROHM CO., LTD. 发明人 OKI, TETSURO;HARADA, KOICHIRO;NEKI, RYUICHI;KAWAKAMI, KAZUO;MIYATA, TSUYOSHI;MATSUO, KOZO
分类号 H01L21/28;H01L21/301;H01L21/304;H01L21/78;(IPC1-7):H01L21/463 主分类号 H01L21/28
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