发明名称 POERATING SYSTEM OF DOUBLE STRUCTURE RETICLE FOR REDUCTION PROJECTING EXPOSURE APPARATUS
摘要 The device improves the trapezoidal, magnification, and rotational error by the position control of X,Y,Z direction, and minimizes the error between exposure circuit pattern(7) and ideal circuit pattern(6). The device includes the X,Y direction drivers(8,9) which are driven by X,Y directional motors(18,19), the X,Y,Z direction drivers(10) which are driven by the piezo electronic device(23), the X,Y direction air bearings(12,15) placed in the X,Y direction drivers(8,9), and the reduces the error of magnification, trapezoidal, rotation error by position control.
申请公布号 KR950011166(B1) 申请公布日期 1995.09.28
申请号 KR19920020982 申请日期 1992.11.10
申请人 KOREA ELECTRONICS & TELECOMUNICATION RESEARCH INSTITUTE 发明人 JANG, WON - IK
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址