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发明名称
Verfahren zur Herstellung einer Halbleiterspeicheranordnung.
摘要
申请公布号
DE69017803(T2)
申请公布日期
1995.09.28
申请号
DE19906017803T
申请日期
1990.08.30
申请人
KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP
发明人
TSUNODA, HIROAKI, 1-1-1, SHIBAURA, MINATO-KU, TOKYO, JP
分类号
H01L21/8247;H01L21/28;H01L29/788;H01L29/792;(IPC1-7):H01L29/788
主分类号
H01L21/8247
代理机构
代理人
主权项
地址
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