发明名称 PROCESSING DEVICE FOR PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To prevent defect in plate making by a dip developing method, to enable quick processing, to always supply a new processing solution efficiently, and to enable processing with a small quantity of waste processing solution so as to eliminate complicatedness in maintenance by supplying a developing solution to a developing solution applying part corresponding to the width of a plate so as to develop a photosensitive material. CONSTITUTION:A photosensitive material P is inserted from an inlet guide 7, and the cross- direction positional information is obtained from the material by a width detecting sensor 8 to control a driving motor 9. A processing liquid drop nozzle 4 is repeatedly moved between both ends in the cross direction of the photosensitive material P to supply the processing liquid, and the liquid is applied to the material by bar-like members 1. Though the nozzle is repeatedly moved between both ends in the cross direction of the photosensitive material P, the liquid staying in a gap between a pair of bar-like members 1 is about to spread regardless of any influence on the surface tension of the processing liquid, so that it is indifferent to shifting a little inside from the both end positions in the cross direction. Thus, the consumption amount can be reduced by applying the quantity of a processing liquid according to the plate size and always supplying a new processing liquid to the plate to prevent deterioration, so that the processing liquid is prevented from being spread to the unnecessary back of the plate.
申请公布号 JPH07234518(A) 申请公布日期 1995.09.05
申请号 JP19940022735 申请日期 1994.02.21
申请人 MITSUBISHI PAPER MILLS LTD 发明人 ANDO MASAKAZU;TANNO YOSHIYUKI
分类号 G03F7/07;G03D9/00;G03F7/30;(IPC1-7):G03F7/30 主分类号 G03F7/07
代理机构 代理人
主权项
地址
您可能感兴趣的专利