| 发明名称 |
Positive photoresist composition containing photoacid generator and use thereof. |
| 摘要 |
A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof. |
| 申请公布号 |
EP0619522(A3) |
申请公布日期 |
1995.07.26 |
| 申请号 |
EP19940301531 |
申请日期 |
1994.03.03 |
| 申请人 |
IBM |
发明人 |
CARPENTER BURTON JESSE JR;MCMASTER MICHAEL GEORGE;LATORRE JOSEPH;SIMPSON LOGAN LLOYD |
| 分类号 |
G03F7/004;G03F7/029;G03F7/039;H01L21/027;H01L21/30;H05K3/06 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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