发明名称 STAGE DEVICE
摘要 <p>PURPOSE:To lessen a work in amount of deviation in a lateral direction when the work is corrected in gradient. CONSTITUTION:A wafer 21 is placed on a gradient correction table 23 through the intermediary of a wafer chuck 22, a ring-shaped plate spring 25 is mounted on a gradient correction table 23 through the intermediary of mounting screws 28D to 28F, and the ring-shaped plate spring 25 is mounted on projections 24a and 24c of a base plate 24 through the intermediary of mounting screws 28A to 28C. A wafer 21 is corrected in angle of inclination and height by displacing three pivots 32A to 32C provided to the base of the gradient correction table 23 with a vertical drive means 26A provided onto the base plate 24.</p>
申请公布号 JPH07161799(A) 申请公布日期 1995.06.23
申请号 JP19930302695 申请日期 1993.12.02
申请人 NIKON CORP 发明人 SAKAMOTO HIDEAKI
分类号 G01B11/00;G01B11/26;G03F7/20;H01L21/027;H01L21/66;H01L21/68;(IPC1-7):H01L21/68 主分类号 G01B11/00
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