发明名称 METHOD FOR TREATING WASTE LIQUID FROM PHOTOGRAPH DEVELOPING
摘要 PURPOSE:To remove inexpensively, conveniently and highly accurately a metal from a photographic waste liq. by a method wherein a specified amt. of a polymer chelating agent is incorporated in the photographic waste liq. to form a polymer-metal complex and this is filtrated by means of a monolayer filter with a specified pore size. CONSTITUTION:A polymer chelating agent within a range of 0.5-4 equivalent to a metal included in a photographic waste liq. is incorporated in the photographic waste liq. to form a polymer-metal complex and then, this polymer-metal complex is filtrated by using a monolayer filter with a pore size of 0.05-10mum to remove the metal. Namely, a sensitive material is developed, bleached and washed in a developing liq. N1, a bleaching liq. N2 and a washing tank W1 and then, it is fixed in a fixing tank N3 and is poured into a stock tank 1 from a washing tank W2. A soln. of the polymer chelating agent is fed from a tank 2 contg. the soln. of the polymer chelating agent to form the polymer- metal compex. Then, the mixed liq. in the stock tank 1 is transferred to a filter apparatus 3, wherein precipitation of the polymer-metal complex is filtrated.
申请公布号 JPH07148492(A) 申请公布日期 1995.06.13
申请号 JP19930320928 申请日期 1993.11.29
申请人 FUJI PHOTO FILM CO LTD 发明人 NAKAMURA TAKASHI;MATSUO YASUSHI;YAMADA MASAHARU
分类号 G03C5/00;C02F1/62;C02F1/64;C02F1/68;C25C1/20;G03C7/44;G03D3/00;(IPC1-7):C02F1/62 主分类号 G03C5/00
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