SOLVENT FOR WASHING AND REMOVING RESIST AND PRODUCTION OF BASE MATERIAL FOR PRODUCING ELECTRONIC PARTS WITH THE SAME

摘要

PURPOSE:To obtain a solvent excellent in resist dissolving power, having low toxicity and aging stability of the dissolving power and producing no residue or deposit and to efficiently obtain a high quality base material for producing electronic parts by using the solvent. CONSTITUTION:This solvent contains propylene glycol monoalkyl ether and a compd. represented by the formula R<1>O(CH2)nCOOR<2> [where each of R<1> and R<2> is lower alkyl and (n) is 2-4]. The base material is coated with a resist- forming coating material by means of a spinner and unnecessary parts of the coating material sticking to the peripheral part, edge part and rear side of the substrate are removed with this solvent to produce the objective base material for producing electronic parts.