| 摘要 |
PURPOSE:To improve a total alignment accuracy over a plurality of layers by performing overlapping in reference to two type of overlapping masks or more formed by a first layer, a second layer, and further a plurality of layers. CONSTITUTION:Each position of a first layer 4 and a second layer 5 is measured. Then, the amount of each deviation for a third layer 6 is led and the third layer 6 is positioned at the middle position which is averaged for both layers. Then, exposure is executed. In the alignment of the first layer 4 and the second layer 5, a misalignment error 8 is generated at + side in X direction and it is suppressed that the misalignment which the third layer 6 generates for the second layer 5 in the alignment of the third layer 6 is in the same direction as the misalignment error 8 generated for the first layer 4 to execute alignment. |
