发明名称 TREATMENT METHOD FOR PHOTOSENSITIVE LITHOGRAPHY PLATE
摘要 PURPOSE:To enhance safety at a development process and improve the processability of waste liquid by developing a photosensitive lithography plate having a photosensitive layer on an aluminum plate treated with a specific sand grinding process, using an aqueous alkaline developer. CONSTITUTION:The carrier of this lithography plate is subjected to a sand grinding process where the surface of an aluminum plate mechanically roughened via ball grinding or the like is chemically treated and, then, electrochemically roughened with nitric acid, sulfuric acid, a mixture thereof, or the like as a grinding process, or subjected to a sand grinding process where the surface of the aluminum plate is electrolytically roughened, using liquid mainly composed of nitric acid. The photosensitive lithography plate having a photosensitive layer composed of a photosensitive composition is developed on this sand grindered carrier, using an aqueous alkaline developer virtually containing no solvent and having a pH value equal to or less than 12. Thus, sufficient printing resistance can be provided and at the same time, the degree of contamination at a printing process can be restrained. Also, a handling danger such as hand decay or the loss of eyesight at a development process can be prevented and the processability of waste liquid can be improved.
申请公布号 JPH07104479(A) 申请公布日期 1995.04.21
申请号 JP19930268398 申请日期 1993.09.30
申请人 KONICA CORP;MITSUBISHI CHEM CORP 发明人 KOJIMA NORIYOSHI;MATSUBARA SHINICHI;NAKAI HIDEYUKI;TAKAGI KOJI;TONO KATSUHIKO;KOYA YOSHIHIRO;TOMIYASU HIROSHI;TAKADA TERUO
分类号 G03F7/00;B41N3/03;B41N3/04;G03F7/30;(IPC1-7):G03F7/30 主分类号 G03F7/00
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