PLASMA VAPOR PHASE REACTOR

摘要

PURPOSE:To uniformize the thickness of a film formed on the surface of a substrate through a plasma vapor phase reaction by impressing electric fields from a plurality of sets of parallel paired electrodes upon the film forming surface of the substrate set in a reaction space in which plasma is provided. CONSTITUTION:A vapor phase reaction is made to take place while a first electric field 90 is impressed upon the film forming surface of a substrate in almost parallel with the film forming surface form a pair of electrodes 23 and 25 and, at the same time, a second electric field 91 perpendicular to the first electric field 90 is impressed upon the film forming surface from another pair of electrodes 72 and 82. The electrodes 23 and 25 and 72 and 82 are respectively connected to a first oscillator and a second oscillator 85.