| 摘要 |
<p>The invention relates to a process for producing microstructure bodies tapering as the height increases so that sieves or nets, for example, can be formed by galvanic shaping, the apertures of which are smaller on one side than on the other. The process of the invention comprises the usual steps in the X-ray deep lithography on an X-ray resist; in addition, the X-ray resist is subjected to a second irradiation over the entire surface in which the characteristic dose limit is not attained in the X-ray resist.</p> |
