EXPOSURE UNIT AND METHOD FOR EXPOSING PHOTOSENSITIVE MATERIALS
摘要
An exposure unit and method for imaging a photosensitive material includes a source of radiation for exposing the photosensitive material to actinic radiation such that the radiation strikes the photosensitive material at a plurality of angles of incidence, and apparatus for moving the radiation source relative to and in a plane parallel to the photosensitive material. The exposure unit also has a reflector for controlling (1) the proportion of (a) radiation having perpendicular angles of incidence to (b) radiation having non-perpendicular angles of incidence, such that the radiation having non-perpendicular angles is increased, and (2) the distribution of non-perpendicular angles of incidence.
申请公布号
WO9503564(A1)
申请公布日期
1995.02.02
申请号
WO1994US08369
申请日期
1994.07.25
申请人
E.I. DU PONT DE NEMOURS AND COMPANY;OHLIG, ALBERT, HANS;NELSON, STEVEN, WILLIAM
发明人
OHLIG, ALBERT, HANS;NELSON, STEVEN, WILLIAM;VERBIAR, ROBERT, JOHN;CUSHNER, STEPHEN