发明名称 EXPOSURE UNIT AND METHOD FOR EXPOSING PHOTOSENSITIVE MATERIALS
摘要 An exposure unit and method for imaging a photosensitive material includes a source of radiation for exposing the photosensitive material to actinic radiation such that the radiation strikes the photosensitive material at a plurality of angles of incidence, and apparatus for moving the radiation source relative to and in a plane parallel to the photosensitive material. The exposure unit also has a reflector for controlling (1) the proportion of (a) radiation having perpendicular angles of incidence to (b) radiation having non-perpendicular angles of incidence, such that the radiation having non-perpendicular angles is increased, and (2) the distribution of non-perpendicular angles of incidence.
申请公布号 WO9503564(A1) 申请公布日期 1995.02.02
申请号 WO1994US08369 申请日期 1994.07.25
申请人 E.I. DU PONT DE NEMOURS AND COMPANY;OHLIG, ALBERT, HANS;NELSON, STEVEN, WILLIAM 发明人 OHLIG, ALBERT, HANS;NELSON, STEVEN, WILLIAM;VERBIAR, ROBERT, JOHN;CUSHNER, STEPHEN
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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