发明名称 |
Process and apparatus for supplying zinc vapor continuously to a chemical vapor deposition process from a continuous supply of solid zinc |
摘要 |
A process and apparatus for the manufacture of chemical vapor deposition deposited structures which comprises supplying a solid zinc metal continuously to a heated retort at a controlled rate. The retort is a body of refractory material having a top and a bottom and a traverse cross section which decreases from the top to the bottom of the retort. The zinc is melted, vaporized, and conveyed to a chemical vapor deposition zone defined by a number of heated mandrel plates where it is reacted with either hydrogen sulfide or hydrogen selenide to form a chemical vapor deposited structure. The process and apparatus provide for improved control over the evaporation rate of zinc and a reduction in the furnace volume needed to melt and vaporize the zinc.
|
申请公布号 |
US5383969(A) |
申请公布日期 |
1995.01.24 |
申请号 |
US19930042933 |
申请日期 |
1993.04.05 |
申请人 |
CVD, INC. |
发明人 |
TEVEROVSKY, ALEXANDER;MACDONALD, JAMES C.;PICKERING, MICHAEL A.;KIRSCH, JEFFERY L. |
分类号 |
C23C14/24;C23C16/30;C23C16/44;C23C16/448;(IPC1-7):C23C16/00;C23C14/00 |
主分类号 |
C23C14/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|