发明名称 Process and apparatus for supplying zinc vapor continuously to a chemical vapor deposition process from a continuous supply of solid zinc
摘要 A process and apparatus for the manufacture of chemical vapor deposition deposited structures which comprises supplying a solid zinc metal continuously to a heated retort at a controlled rate. The retort is a body of refractory material having a top and a bottom and a traverse cross section which decreases from the top to the bottom of the retort. The zinc is melted, vaporized, and conveyed to a chemical vapor deposition zone defined by a number of heated mandrel plates where it is reacted with either hydrogen sulfide or hydrogen selenide to form a chemical vapor deposited structure. The process and apparatus provide for improved control over the evaporation rate of zinc and a reduction in the furnace volume needed to melt and vaporize the zinc.
申请公布号 US5383969(A) 申请公布日期 1995.01.24
申请号 US19930042933 申请日期 1993.04.05
申请人 CVD, INC. 发明人 TEVEROVSKY, ALEXANDER;MACDONALD, JAMES C.;PICKERING, MICHAEL A.;KIRSCH, JEFFERY L.
分类号 C23C14/24;C23C16/30;C23C16/44;C23C16/448;(IPC1-7):C23C16/00;C23C14/00 主分类号 C23C14/24
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