发明名称 |
Cathode-sputtering apparatus comprising a device for measuring critical target consumption |
摘要 |
A cathode-sputtering apparatus for the surface-coating of objects has a vacuum chamber which contains a helium-group gas, in which chamber a target cathode and an anode are arranged. A voltage for producing plasma discharges is applied to these electrodes and a magnetic field is applied, which intensifies the plasma discharges and concentrates them at the location of the target cathode. For measuring a critical target-consumption condition, at least one probe is provided in the target cathode, which probe is actuated when the target material is eroded up to the probe.
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申请公布号 |
US5380419(A) |
申请公布日期 |
1995.01.10 |
申请号 |
US19930057204 |
申请日期 |
1993.05.05 |
申请人 |
U.S. PHILIPS CORP.;DU PONT OPTICAL CO. |
发明人 |
EGGERS, GERHARD F.;LANGOWSKI, HORST-CHRISTIAN |
分类号 |
C23C14/34;H01J37/32;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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