发明名称 EXCIMER LASER BEAM PROCESSING METHOD, EXCIMER LASER BEAM MACHINE FOR EXECUTING THIS PROCESSING METHOD, NOZZLE SHEET FORMED BY THIS PROCESSING MACHINE AND INK JET RECORDING HEAD HAVING THIS NOZZLE SHEET
摘要 PURPOSE:To surely prevent the deposition of microsplinters on a processing surface by holding a work within a processing atmosphere subjected to a pressure reduction and irradiating the work with an excimer laser beam within this atmosphere. CONSTITUTION:The processing surface of the work 11 is irradiated with the excimer laser beam generated by an excimer laser oscillator 22 and the work 11 is formed to a prescribed shape by using the excimer laser beam machine 10. The work 11 is, thereupon, housed in a vacuum vessel 12. The work 11 is held in the processing atmosphere in the vacuum vessel 12 in which the pressure is reduced down to a prescribed pressure. The work 11 is then irradiated with the excimer laser beam in the processing atmosphere. The processing atmosphere is maintained under <=1X10<-1>Torr. The processing atmosphere consists of gas contg <=10atm.% oxygen. As a result, the flying distance of the microsplinters is extended.
申请公布号 JPH06297180(A) 申请公布日期 1994.10.25
申请号 JP19930088288 申请日期 1993.04.15
申请人 RICOH CO LTD 发明人 TEZUKA SHINJI;OGAKI TAKASHI
分类号 B23K26/08;B23K26/12;B23K26/14;B41J2/135 主分类号 B23K26/08
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