发明名称 |
EXCIMER LASER BEAM PROCESSING METHOD, EXCIMER LASER BEAM MACHINE FOR EXECUTING THIS PROCESSING METHOD, NOZZLE SHEET FORMED BY THIS PROCESSING MACHINE AND INK JET RECORDING HEAD HAVING THIS NOZZLE SHEET |
摘要 |
PURPOSE:To surely prevent the deposition of microsplinters on a processing surface by holding a work within a processing atmosphere subjected to a pressure reduction and irradiating the work with an excimer laser beam within this atmosphere. CONSTITUTION:The processing surface of the work 11 is irradiated with the excimer laser beam generated by an excimer laser oscillator 22 and the work 11 is formed to a prescribed shape by using the excimer laser beam machine 10. The work 11 is, thereupon, housed in a vacuum vessel 12. The work 11 is held in the processing atmosphere in the vacuum vessel 12 in which the pressure is reduced down to a prescribed pressure. The work 11 is then irradiated with the excimer laser beam in the processing atmosphere. The processing atmosphere is maintained under <=1X10<-1>Torr. The processing atmosphere consists of gas contg <=10atm.% oxygen. As a result, the flying distance of the microsplinters is extended. |
申请公布号 |
JPH06297180(A) |
申请公布日期 |
1994.10.25 |
申请号 |
JP19930088288 |
申请日期 |
1993.04.15 |
申请人 |
RICOH CO LTD |
发明人 |
TEZUKA SHINJI;OGAKI TAKASHI |
分类号 |
B23K26/08;B23K26/12;B23K26/14;B41J2/135 |
主分类号 |
B23K26/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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