PATTERNED LAYER FORMING METHOD

摘要

PURPOSE:To avoid the deterioration in the sensitivity and the resolving power of a chemically sensitized resist layer by a method wherein the chemically sensitized resist layer is immersed in an acid solution during the term until the first heat-treating step is performed for said resist layer coat-formed on a substrate. CONSTITUTION:A chemically sensitized resist layer containing an acid producing agent is coat-formed (a) on a silicon substrate 1 to be immersed in an acid solution (f). Next, the first heat-treating step (b) is performed for the chemically sensitized resist layer to form said resist the first heat-treated. Next, said resist layer the first heat-treated is exposed (c) after a specific pattern to form said resist layer pattern exposed. Next, the second heat-treating step (d) is performed for said resist layer pattern exposed to form said resist layer the second heat- treated and finally, a patterned layer 2 having the pattern corresponding to the exposed pattern is to be formed by developing step (e).