CLEANING AGENT CONTAINING NUCLEOPHILIC AMINE COMPOUND PROVIDED WITH REDUCTION AND OXIDATION POTENTIAL

摘要

PURPOSE: To obtain a resist and etching residue removing compsn. consisting of at least one kind of nucleophilic amine compd. having oxidation and reduction potentials, at least one kind of solvent miscible with the amine compd., water and one or more kinds of optional chelating agents and to wash a microcircuit board by removing a resist with the compsn. CONSTITUTION: This detergent compsn. for removing a resist and etching residue from a substrate contains at least one kind of nucleophilic amine compd. having oxidation and reduction potentials, at least one kind of org. solvent, water and an optional chelating agent. The amine compd. and org. solvent exist by amts. enough to remove the resist and etching residue. The chelating agent is preferably contained so as to impart effect over a long period of time to this compsn. by ensuring stability and activity.