| 发明名称 |
METHOD OF MANUFACTURING A GLASS SUBSTRATE FOR A THIN FILM |
| 摘要 |
A method of forming a silicon oxide film (11) on a glass substrate surface (10) by a low temperature chemical vapor deposition process using trialkoxysilane and ozone, thereby smoothing said surface. |
| 申请公布号 |
WO9418356(A1) |
申请公布日期 |
1994.08.18 |
| 申请号 |
WO1994US01278 |
申请日期 |
1994.02.04 |
| 申请人 |
WATKINS-JOHNSON COMPANY |
发明人 |
HARADA, KATSUYOSHI;HATTORI, SATOSHI |
| 分类号 |
C03C17/245;C23C16/40;H01L21/316;H01L29/78;H01L29/786;H01L51/05;(IPC1-7):C23C16/40;B05D5/06 |
主分类号 |
C03C17/245 |
| 代理机构 |
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代理人 |
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