发明名称 Integrated light deflector and method of fabrication therefor
摘要 An integrated light deflector and fabrication method are disclosed. In accordance with the method, a mold is constructed above the surface of a substrate using a thick photo resist and a mask to define a deflector plane. A collimated light beam is applied at an appropriate angle of incidence to the photo resist material and mask. The developed resist provides a mold into which the deflector body is cast, leaving a deflector body whose front surface serves as the deflecting surface.
申请公布号 US5327415(A) 申请公布日期 1994.07.05
申请号 US19930173720 申请日期 1993.12.23
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 VETTIGER, PETER;VOEGELI, OTTO
分类号 H01L27/15;G03F7/00;G03F7/20;H01S5/00;H01S5/042;H01S5/18;(IPC1-7):G02B6/32 主分类号 H01L27/15
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